2credit hour(s)Prerequisite:MEMS 1002 + MEMS 1092 or department approval. Corequisite:MEMS 2192. Focuses on Microelectromechanical systems (MEMS) surface and bulk fabrication processes including photolithography, wet and dry anisotropic and isotropic etch, and thin film deposition methods. These processes are also used in semiconductor and nanotechnology applications. No books required, all is provided online and includes reading, animations, and streaming lecture educational materials.