1credit hour(s)Prerequisite:MEMS 1002 + MEMS 1092 or department approval. Pre- or corequisite:MEMS 2102. Focuses on Microelectromechanical systems (MEMS) surface and bulk fabrication processes including photolithography, wet and dry anisotropic and isotropic etch, and thin film deposition methods. These processes are also used in semiconductor and nanotechnology applications. Students will fabricate an actual microsystems device at the University of New Mexico’s MTTC cleanroom. No books or lab materials are required; all is provided.